Hitachi High-Technologies Corporation (TSE:8036, Hitachi High-Tech) and Picosun Oy announce a revolutionary technological co-operation in plasma-enhanced atomic layer deposition (PE-ALD). The aim of ...

Common plasma sources, such as CCP and ICP, were created decades ago for use in the semiconductor industry. At that time, plasma sources were primarily used to deposit silicon oxide and silicon ...

Layerava from Okyay Tech is an adaptable research device designed for university and industrial research laboratories that use Hollow Cathode Plasma Enhanced Atomic Layer Deposition (HCP-ALD).

This case study focuses on improving the plasma used in plasma-enhanced metallic atomic layer deposition, a process that creates ultra-thin metallic films. By optimizing the plasma conditions, the ...

FREMONT, Calif., Dec. 10, 2024 (GLOBE NEWSWIRE) -- ACM Research, Inc. (ACMR) (“ACM”) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced packaging ...

Beneq, a global leader in Atomic Layer Deposition (ALD) equipment and solutions, announced Beneq Transmute, a next-generation ALD platform designed for high-volume semiconductor manufacturing. Beneq ...

Installation of plasma deposition tool at chip research manufacturing line is part of $10 million in upgrades to R&D chipmaking equipment Bryant Colwill, manager of the University at Albany’s College ...

Veeco Instruments Inc. has announced that Veeco CNT, formerly known as Ultratech/Cambridge Nanotech, shipped its 500th atomic layer deposition (ALD) system to North Carolina State University. The ...

BILTHOVEN, The Netherlands–Making its second acquisition in recent weeks, ASM International N.V. Monday (April 26) announced it has acquired Genitech Inc., a South Korean supplier of plasma enhanced, ...

New platform delivers ALD film quality at production throughput for Wide Bandgap and other specialty device manufacturing ESPOO, Finland, Nov. 19, 2025 /PRNewswire/ -- Beneq, a global leader in Atomic ...