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5:05
Our cryogenic dielectric etch technology—Lam Cryo 3.0—delivers enhanced etch rates, vertical high aspect ratio (HAR) profiles, and more. Learn how Lam Cryo 3.0 is optimized to manufacture next-generation 3D NAND devices with 400 layers and beyond from Group VP and GM of Etch Product Group, Harmeet Singh. https://bit.ly/3yCkBVv | Lam Research Corporation
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Plasma etch: where science meets precision. Using plasma, chipmakers can carve microscopic patterns on a wafer. Learn how our plasma etch systems define the pathways that bring advanced technology to life. https://bit.ly/4mji5qd | Lam Research Corporation
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